Dynamic Electrical and Fluid Delivery System with Indexing Motion for Batch Processing Chambers

ABSTRACT

Process assemblies and cable management assemblies for managing cables in tight envelopes. A processing assembly includes a top chamber having at least one substrate support, a support shaft, a robot spindle assembly, a stator and a cable management system. The cable management system includes an inner trough assembly and an outer trough assembly configured to move relative to one another, and a plurality of chain links configured to house at least one cable for delivering power to the process assembly.

TECHNICAL FIELD

Embodiments of the disclosure generally relate to electrical and fluiddelivery systems for rotating assemblies of batch processing chambers.In particular, embodiments of the disclosure are directed to modularelectrical and/or fluid delivery systems that improve electrical andfluid line longevity.

BACKGROUND

In some chamber designs for atomic layer deposition (ALD) or chemicalvapor deposition (CVD) processing, precursors and gases are delivered toa large substrate support or multiple substrate support surfaces throughmultiple gas distribution plates at the same time. The gas distributionplates are spaced from the substrate surfaces, or vice versa, formingone or more operational gaps. Such chambers can be highly sensitive tothe consistency and uniformity of the gaps between different processstations and over time as the chamber is used. With gaps of about onemillimeter for some multi-station deposition systems, the processesperformed in the separate stations can be highly susceptible to smallgap deviations.

The substrates supports for some processing chambers use a motorassembly with a shaft and at least one support surface. The shaftextends through a bottom of the processing chamber and maintains thesupport surfaces.

Conventional single and multi-wafer processing chambers often employcomplex configurations for delivering current and fluid to rotatingcomponents such as slip rings, moving cables, and feed throughmechanism. Such configurations tend to be prone to failure in processingchambers having tight envelopes and long processing times.

Therefore, there is a need in the art for apparatus and methods formanaging cables and fluid delivery channels through tight envelopes.

SUMMARY

One or more embodiments of the disclosure are directed to cablemanagement systems comprising an outer trough assembly and an innertrough assembly. The outer trough assembly comprises an outer troughboundary with a semi-cylindrical shape with a central axis, an innersurface and an outer surface. An outer guide has a semi-cylindricalshape with a central axis, an inner surface and an outer surface. Thecentral axis of the outer guide is coaxial with the central axis of theouter trough boundary.

The inner trough assembly is positioned within the outer troughassembly. The inner trough assembly comprises a bottom plate with a topsurface and a bottom surface. A base has a top surface and bottomsurface that is connected to the top surface of the bottom plate. Asemi-cylindrical inner guide is connected to the base and has an innersurface and an outer surface. The semi-cylindrical inner guide has anaxis normal to the base. A mounting bracket has a top portion and abottom portion connected to the base, an inner surface and an outersurface. The top portion has a connector plate and a shaft couplingconfigured to receive a hollow support shaft. A channel is formedbetween the inner surface of the outer guide of the outer troughassembly and the inner surface of the outer surface of the mountingbracket.

Additional embodiments of the disclosure are directed to processingassemblies comprising a top chamber with at least one substrate support.A support shaft has a top end and a bottom end. The top end extendsthrough the top chamber and is connected to the substrate support. Arobot spindle assembly is connected to the top chamber. An outer guidehas a semi-cylindrical shape with a central axis, an inner surface andan outer surface. The central axis of the outer guide is coaxial withthe central axis of the outer trough boundary.

An inner trough assembly is positioned within the outer trough assemblyand comprises a bottom plate having a top surface and a bottom surface,a base having a top surface and bottom surface. The bottom surface ofthe base is connected to the top surface of the bottom plate. Asemi-cylindrical inner guide is connected to the base. Thesemi-cylindrical inner guide has an inner surface and an outer surfaceand an axis normal to the base.

A mounting bracket with a top portion and a bottom portion is connectedto the base. The mounting bracket has an inner surface and an outersurface. The top portion has a connector plate and a shaft couplingconfigured to receive a hollow support shaft. A stator is connected to astator bracket. The stator bracket is connected to the outer troughboundary of the outer trough assembly. A channel is formed between theinner surface of the outer guide of the outer trough assembly and theinner surface of the outer surface of the mounting bracket.

Further embodiments of the disclosure are directed to cable managementsystems comprising an outer trough assembly and an inner troughassembly. The outer trough assembly comprises an outer trough boundarywith a semi-cylindrical shape with a central axis, an inner surface andan outer surface. An outer guide has a semi-cylindrical shape with acentral axis, an inner surface and an outer surface. The central axis ofthe outer guide is coaxial with the central axis of the outer troughboundary.

The inner trough assembly is positioned within the outer troughassembly. The inner trough assembly comprises a bottom plate with a topsurface and a bottom surface. A base has a top surface and bottomsurface. The bottom surface of the base is connected to the top surfaceof the bottom plate. A semi-cylindrical inner guide is connected to thebase and has an inner surface and an outer surface. The semi-cylindricalinner guide has an axis normal to the base.

A mounting bracket with a top portion and a bottom portion connected tothe base, an inner surface and an outer surface. The top portion has aconnector plate and a shaft coupling configured to receive a hollowsupport shaft. A hollow shaft extends form the shaft coupling.

A stator bracket is connected to the outer guide and to the outer troughboundary. A stator is positioned on the stator bracket, and a rotor ispositioned around the stator and is connected to the inner troughassembly. The rotor and stator are configured to cooperatively interactto cause the inner trough assembly to rotate within the outer troughassembly. A plurality of chain links are configured to receive at leastone cable within.

A rotary fluid union is within the mounting bracket and is configured todeliver fluid to a plurality of fluid tubes extending through the cavityof the shaft. A channel is formed between the inner surface of the outerguide of the outer trough assembly and the inner surface of the outersurface of the mounting bracket. The outer trough assembly furthercomprises a semi-circular base plate connected to a bottom of thesemi-cylindrical boundary. The inner trough assembly further comprises ahard stop disposed on an outer surface of the shaft coupling. The hardstop is configured to limit rotation of the inner trough assemblyrelative to the outer trough assembly.

BRIEF DESCRIPTION OF THE DRAWINGS

So that the manner in which the above recited features of the presentdisclosure can be understood in detail, a more particular description ofthe disclosure, briefly summarized above, may be had by reference toembodiments, some of which are illustrated in the appended drawings. Itis to be noted, however, that the appended drawings illustrate onlytypical embodiments of this disclosure and are therefore not to beconsidered limiting of its scope, for the disclosure may admit to otherequally effective embodiments.

FIG. 1 shows a cross-sectional isometric view of a processing chamber inaccordance with one or more embodiments of the disclosure;

FIG. 2 shows a cross-sectional view of a processing chamber inaccordance with one or more embodiments of the disclosure;

FIG. 3A shows a cross-sectional view of a processing chamber inaccordance with one or more embodiments of the disclosure;

FIG. 3B shows a perspective view of a processing assembly in accordancewith one or more embodiments of the disclosure;

FIG. 3C shows a side view of a processing assembly in accordance withone or more embodiments of the disclosure;

FIG. 4 shows a perspective view of a cable management assembly inaccordance with one or more embodiments of the disclosure;

FIG. 5 shows a perspective view of an outer trough assembly inaccordance with one or more embodiments of the disclosure;

FIG. 6 shows a perspective view of an outer trough assembly inaccordance with one or more embodiments of the disclosure;

FIG. 7 shows a perspective view of an outer trough assembly inaccordance with one or more embodiments of the disclosure;

FIG. 8 shows a perspective view of an inner trough assembly inaccordance with one or more embodiments of the disclosure;

FIG. 9 shows a schematic representation of a plurality of chain links inaccordance with one or more embodiments of the disclosure;

FIG. 10 shows a perspective view of a fluid union in accordance with oneor more embodiments of the disclosure; and,

FIG. 11 shows a schematic representation of a processing platform inaccordance with one or more embodiment of the disclosure;

DETAILED DESCRIPTION

Before describing several exemplary embodiments of the disclosure, it isto be understood that the disclosure is not limited to the details ofconstruction or process steps set forth in the following description.The disclosure is capable of other embodiments and of being practiced orbeing carried out in various ways.

As used in this specification and the appended claims, the term“substrate” refers to a surface, or portion of a surface, upon which aprocess acts. It will also be understood by those skilled in the artthat reference to a substrate can also refer to only a portion of thesubstrate, unless the context clearly indicates otherwise. Additionally,reference to depositing on a substrate can mean both a bare substrateand a substrate with one or more films or features deposited or formedthereon

A “substrate” as used herein, refers to any substrate or materialsurface formed on a substrate upon which film processing is performedduring a fabrication process. For example, a substrate surface on whichprocessing can be performed include materials such as silicon, siliconoxide, strained silicon, silicon on insulator (SOI), carbon dopedsilicon oxides, amorphous silicon, doped silicon, germanium, galliumarsenide, glass, sapphire, and any other materials such as metals, metalnitrides, metal alloys, and other conductive materials, depending on theapplication. Substrates include, without limitation, semiconductorwafers. Substrates may be exposed to a pretreatment process to polish,etch, reduce, oxidize, hydroxylate, anneal, UV cure, e-beam cure and/orbake the substrate surface. In addition to film processing directly onthe surface of the substrate itself, in the present disclosure, any ofthe film processing steps disclosed may also be performed on anunderlayer formed on the substrate as disclosed in more detail below,and the term “substrate surface” is intended to include such underlayeras the context indicates. Thus for example, where a film/layer orpartial film/layer has been deposited onto a substrate surface, theexposed surface of the newly deposited film/layer becomes the substratesurface.

One or more embodiments of the disclosure advantageously provide for asupport plate for a cable management assembly configured to managecables and fluid delivery channels through tight envelopes. Furtherembodiments provide for a processing assembly comprising a top chamber,a support shaft, a robot spindle assembly, a stator and a cablemanagement system.

The disclosure provides substrate supports for use with single substrateor multi-substrate (also referred to as batch) process chambers. FIGS. 1and 2 illustrate a top chamber 100 in accordance with one or moreembodiment of the disclosure. FIGS. 3A and 3B illustrate the top chamber100 having a bellows assembly 101 for maintaining low atmosphereenvironment within the top chamber 100. FIG. 1 shows the top chamber 100illustrated as a cross-sectional isometric view in accordance with oneor more embodiment of the disclosure. FIG. 2 shows a top chamber 100 incross-section according to one or more embodiment of the disclosure.FIG. 3A shows the top chamber 100 in cross-section in accordance withone or more embodiment of the disclosure. FIGS. 3B and 3C illustrate aprocessing assembly 90 comprising the top chamber 100, a support shaft190, a robot spindle assembly, a stator 130 and a cable managementsystem 320. FIGS. 4 through 9 illustrate the cable management system320. Accordingly, some embodiments of the disclosure are directed toembodiments of cable management assemblies 320.

The top chamber 100 has a housing 102 with sidewalls 104 and a chamberfloor 106. The housing 102 along with the chamber lid 300 define aprocessing volume 109, also referred to as an interior volume 109.

The processing station 110 illustrated comprises three main components:the chamber lid 300 (also called a lid), a pump/purge insert 330 and agas injector 112. The top chamber 100 further includes a plurality ofprocessing stations 110. The processing stations 110 are located in theinterior volume 109 of the housing 102 and are positioned in a circulararrangement around the rotational axis 211 of the substrate support 200.Each processing station 110 comprises a gas distribution plate 112 (alsoreferred to as a gas injector) having a front surface 114. In someembodiments, the front surfaces 114 of each of the gas injectors 112 aresubstantially coplanar. The processing stations 110 are defined as aregion in which processing can occur. For example, in some embodiments,a processing station 110 is defined as a region bounded by the supportsurface 231 of the substrate support 200, as described below, and thefront surface 114 of the gas injectors 112. In the illustratedembodiment, heaters 230 act as the substrate support surfaces and formpart of the substrate support 200.

The processing stations 110 can be configured to perform any suitableprocess and provide any suitable process conditions. The type of gasdistribution plate 112 used will depend on, for example, the type ofprocess being performed and the type of showerhead or gas injector. Forexample, a processing station 110 configured to operate as an atomiclayer deposition apparatus may have a showerhead or vortex type gasinjector. Whereas, a processing station 110 configured to operate as aplasma station may have one or more electrode and/or grounded plateconfiguration to generate a plasma while allowing a plasma gas to flowtoward the substrate. The embodiment illustrated in FIG. 2 has adifferent type of processing station 110 on the left side (processingstation 110 a) of the drawing than on the right side (processing station110 b) of the drawing. Suitable processing stations 110 include, but arenot limited to, thermal processing stations, microwave plasma,three-electrode CCP, ICP, parallel plate CCP, UV exposure, laserprocessing, pumping chambers, annealing stations and metrology stations.

FIG. 3A illustrates an embodiment where the top chamber 100 furtherincudes a bellows assembly 101 for mounting the a bottom end (notillustrated) of the support post 190 outside of the interior volume 109while still maintaining low pressure conditions within the interiorvolume 109. A top end 105 of the bellows assembly 101 is connected tothe chamber floor 106. The chamber floor 106 further includes an opening120 to allow the support post 190 to pass therethrough. In someembodiments the opening 120 in the chamber floor 106 is concentricallypositioned on the rotational axis 211 of the substrate support 200. Therotational axis 211, as can be seen in FIG. 3B, extends in a firstdirection. The first direction may be referred to as the verticaldirection or along the z-axis; however, it will be understood that theuse of the term “vertical” in this manner is not limited to a directionnormal to the pull of gravity. In some embodiments, a motor 103 is incontact with the chamber floor 106, the motor 103 positioned outside theinterior volume 109 of the chamber.

As illustrated in FIGS. 3B and 3C, in some embodiments a robot spindleassembly 111 is in contact with a bottom end (not shown) of the bellowsassembly 101. In some embodiments, a fluid union 322 is configured todeliver fluid through the support shaft 190. In some embodiments, thetop chamber 100, support shaft 190 and the robot spindle assembly 111are components of a processing assembly 90. In some embodiments, theprocessing assembly 90 comprises the top chamber 100, the support shaft190, the robot spindle assembly 111, a stator 130 and a cable managementsystem 320. In some embodiments, a frame 92 surrounds the support shaft190, the robot spindle assembly 111, the stator 130 and the cablemanagement system 320. The frame 92 is in contact with the top chamber100.

As illustrated in FIG. 4, the cable management system 320 comprises anouter trough assembly 370. The inner trough assembly 370 is positionedwithin the outer trough assembly 370. The inner trough assembly 370 isconfigured to receive the hollow support shaft 190 within a shaftcoupling 371.

As illustrated in FIGS. 5 through 7, the outer trough assembly 340comprises an outer trough boundary 342 having a semi-cylindrical shapewith a central axis 341. The outer trough boundary 342 has an innersurface 344, an outer surface 346, a top end 348 and a bottom end 350.As illustrated, the outer trough boundary 342 has a plurality ofvertical spines 352 joined by a plurality of horizontal bands 353. Theplurality of vertical spines 352 extending from the top end 348 to thebottom end 350. In some embodiments, a sheet having a semi-cylindricalshape is in contact and fully envelopes the plurality of vertical spines352 and the plurality of horizontal bands 353. In some embodiments, theouter trough assembly 340 further comprises a semi-circular base plate369 connected to the bottom end 350 of the semi-cylindrical boundary342. In some embodiments, the base plate 369 extends a distance towardthe central axis 341 of the outer trough assembly 340.

The outer trough assembly 340 further comprises a stator bracket 354having an inner surface 356 and an outer surface 357, the outer surfaceof the stator bracket 354 being connected to the outer trough boundary342. The stator bracket 354 has a semi-circular shape. In someembodiments, the stator bracket 354 comprises two semicircular bodiespositioned across from each other positioned around the central axis 341of the outer trough assembly 340. The stator bracket 354 is positioned aradial distance toward the central axis 341 of the outer trough assembly340, the radial distance of the stator bracket 354 being lesser than aradial distance of the outer trough boundary 342. In some embodiments,the stator bracket 354 is connected to the outer trough boundary 342 bya plurality of horizontal tabs 355. The plurality of horizontal tabs 355extend from the outer surface 357 of the stator bracket 354 to the topend 348 of the outer trough boundary 342. In some embodiments, theplurality of horizontal tabs 355 is covered by a sheet.

The stator bracket 354 is configured to attach to the stator 130. Thestator 130 is enveloped around a rotor. The stator 130 and the rotor areconfigured to cooperatively interact to cause the inner trough assembly370 to rotate within the outer trough assembly 340.

The outer trough assembly further comprises an outer guide 358 having asemi-cylindrical shape with a central axis 359, an inner surface 360 andan outer surface 362. The central axis 359 of the outer guide 358 iscoaxial with the central axis 341 of the outer trough boundary 342. Theouter guide 358 is connected to the stator bracket 354. In someembodiments, the outer guide 358 is connected to the stator bracket 354with a plurality of vertical tabs 364. The plurality of vertical tabs364 extend from a bottom surface of the stator bracket 354 to a topsurface of the outer guide 358. In some embodiments, the outer guide 358is the same radial distance from the central axis 359 as the statorbracket. In some embodiments, the outer guide 358 is positioned a radialdistance toward the central axis 359, the radial distance of the outerguide being lesser than the radial distance of the stator bracket 354.

As illustrated in FIG. 8, the inner trough assembly 370 comprises abottom plate 372, a base plate 378, an inner guide 384, and a mountingbracket 392.

The bottom plate 372 has a top surface 374 and a bottom surface 376. Insome embodiments, the bottom surface 376 of the bottom plate 372 isconnected to the frame 92. In some embodiments, a plurality of standoffsconnects the bottom plate 372 to the frame 92.

The base plate 378 has a top surface 380 and a bottom surface 382. Thebottom surface 372 of the base plate 378 is in contact with the topsurface 374 of the bottom plate 372. In some embodiments, a plurality ofstandoffs connects the bottom plate 372 to the base plate 378.

The inner guide 384 is of a semi-cylindrical shape and is connected tothe base plate 378. The inner guide 384 comprises an inner surface 386,an outer surface 388, a top end 387 and a bottom end 389. In someembodiments, the bottom end 389 is connected to the top surface 380 ofthe base plate 378 with a plurality of tabs 390.

The mounting bracket 392 has a top portion 393, a bottom portion 394, aninner surface 395 and an outer surface 396. The bottom portion 394 isconnected to the top surface 380 of the base plate 378. The top portion393 includes the shaft coupling 371, the shaft coupling configured toreceive the hollow support shaft (not shown).

In some embodiments, the shaft coupling 371 comprises a hard stop 375disposed on an outer surface 373 of the shaft coupling 371. The hardstop 375 is configured to limit rotation of the inner trough assembly370 relative to the outer trough assembly 340. In some embodiments, thehard stop 375 is configured to limit rotation between 0 degrees to 330degrees. In some embodiments, the hard stop 375 has a thicknessconfigured to limit rotation between 0 degrees to 330 degrees.

As shown in FIG. 4, positioning the inner trough assembly 370 within theouter trough assembly 340 forms a channel 332. The channel 332 isconfigured to guide a plurality of chain links (not shown) through therotational movement of the inner trough assembly 370 relative to theouter trough assembly 340. The channel is formed between the innersurface 360 of the outer guide 358 of the outer trough assembly 340 andthe outer surface 388 of the inner guide 384 of the inner troughassembly 370.

FIG. 9 illustrates a top schematic view of the plurality of chain links334 having a fixed end 336 and a moving end 338. The fixed end 336 ispositioned on the outer trough assembly 334, connected to a staticposition. The fixed end 336 is connected to one or more of a powersource, relay or controller. The moving end 338 is connected to themounting bracket 392 of the inner trough assembly 370 and is configuredto rotate with the inner trough assembly 370. The channel 332 guides theplurality of chain links 334 through indexed positions during rotationof the inner trough assembly 370 relative to the outer trough assembly340.

The plurality of chain links are configured to receive two or morecables within. In some embodiments, the two or more cables are arrangedin a side-by-side vertical orientation in a first row such that each ofthe two or more cables experiences the same bend radius and radius ofcurvature. In some embodiments, cables of a tighter bend radius arepositioned adjacent to the first row of cables in a side-by-sidehorizontal orientation relative to the first row.

FIG. 10 illustrates the fluid union 322. The fluid union 322 comprises acylindrical body having a top portion 323 and a bottom portion 324. Thetop portion comprises a bracket 325 configured to connect to themounting bracket 392 of the inner trough assembly 370. The bracket 325is rotatable relative to the bottom portion 324. The bottom portion 324comprises one or more fluid inlets 326. The top portion 323 comprisesone or more fluid outlets 327. The one or more fluid outlets 327 isconfigured to deliver fluid to a plurality of fluid tubes (not shown)extending through a cavity of the support post 190.

FIG. 11 shows a processing platform 400 in accordance with one or moreembodiment of the disclosure. The embodiment illustrated in FIG. 11 ismerely representative of one possible configuration and should not betaken as limiting the scope of the disclosure. For example, in someembodiments, the processing platform 400 has a different numbers of oneor more of the top chambers 100, buffer stations 420 and/or robot 430configurations than the illustrated embodiment.

The exemplary processing platform 400 includes a central transferstation 410 which has a plurality of sides 411, 412, 413, 414. Thetransfer station 410 illustrated has a first side 411, a second side412, a third side 413 and a fourth side 414. Although four sides areillustrated, those skilled in the art will understand that there can beany suitable number of sides to the transfer station 410 depending on,for example, the overall configuration of the processing platform 400.In some embodiments, there the transfer station 410 has three sides,four sides, five sides, six sides, seven sides or eight sides.

The transfer station 410 has a robot 430 positioned therein. The robot430 can be any suitable robot capable of moving a substrate duringprocessing. In some embodiments, the robot 430 has a first arm 431 and asecond arm 432. The first arm 431 and second arm 432 can be movedindependently of the other arm. The first arm 431 and second arm 432 canmove in the x-y plane and/or along the z-axis. In some embodiments, therobot 430 includes a third arm (not illustrated) or a fourth arm (notillustrated). Each of the arms can move independently of other arms.

The embodiment illustrated includes six top chambers 100 with twoconnected to each of the second side 412, third side 413 and fourth side414 of the central transfer station 410. Each of the top chambers 100can be configured to perform different processes.

The processing platform 400 can also include one or more buffer station420 connected to the first side 411 of the central transfer station 410.The buffer stations 420 can perform the same or different functions. Forexample, the buffer stations may hold a cassette of substrates which areprocessed and returned to the original cassette, or one of the bufferstations may hold unprocessed substrates which are moved to the otherbuffer station after processing. In some embodiments, one or more of thebuffer stations are configured to pre-treat, pre-heat or clean thesubstrates before and/or after processing.

The processing platform 400 may also include one or more slit valves 418between the central transfer station 410 and any of the top chambers100. The slit valves 418 can open and close to isolate the interiorvolume within the top chamber 100 from the environment within thecentral transfer station 410. For example, if the processing chamberwill generate plasma during processing, it may be helpful to close theslit valve for that processing chamber to prevent stray plasma fromdamaging the robot in the transfer station.

The processing platform 400 can be connected to a factory interface 450to allow substrates or cassettes of substrates to be loaded into theprocessing platform 400. A robot 455 within the factory interface 450can be used to move the substrates or cassettes into and out of thebuffer stations. The substrates or cassettes can be moved within theprocessing platform 400 by the robot 430 in the central transfer station410. In some embodiments, the factory interface 450 is a transferstation of another cluster tool (i.e., another multiple chamberprocessing platform).

A controller 495 may be provided and coupled to various components ofthe processing platform 400 to control the operation thereof. Thecontroller 495 can be a single controller that controls the entireprocessing platform 400, or multiple controllers that control individualportions of the processing platform 400. For example, the processingplatform 400 of some embodiments comprises separate controllers for oneor more of the individual top chambers 100, central transfer station410, factory interface 450 and/or robots 430.

In some embodiments, the top chamber 100 further comprises a controller495 connected to the plurality of substantially coplanar supportsurfaces 231 configured to control one or more of the first temperatureor the second temperature. In one or more embodiments, the controller495 controls a movement speed of the substrate support.

In some embodiments, the controller 495 includes a central processingunit (CPU) 496, a memory 497, and support circuits 498. The controller495 may control the processing platform 400 directly, or via computers(or controllers) associated with particular process chamber and/orsupport system components.

The controller 495 may be one of any form of general-purpose computerprocessor that can be used in an industrial setting for controllingvarious chambers and sub-processors. The memory 497 or computer readablemedium of the controller 495 may be one or more of readily availablememory such as random access memory (RAM), read only memory (ROM),floppy disk, hard disk, optical storage media (e.g., compact disc ordigital video disc), flash drive, or any other form of digital storage,local or remote. The memory 497 can retain an instruction set that isoperable by the processor (CPU 496) to control parameters and componentsof the processing platform 400.

The support circuits 498 are coupled to the CPU 496 for supporting theprocessor in a conventional manner. These circuits include cache, powersupplies, clock circuits, input/output circuitry and subsystems, and thelike. One or more processes may be stored in the memory 498 as softwareroutine that, when executed or invoked by the processor, causes theprocessor to control the operation of the processing platform 400 orindividual processing chambers in the manner described herein. Thesoftware routine may also be stored and/or executed by a second CPU (notillustrated) that is remotely located from the hardware being controlledby the CPU 496.

Some or all of the processes and methods of the present disclosure mayalso be performed in hardware. As such, the process may be implementedin software and executed using a computer system, in hardware as, e.g.,an application specific integrated circuit or other type of hardwareimplementation, or as a combination of software and hardware. Thesoftware routine, when executed by the processor, transforms the generalpurpose computer into a specific purpose computer (controller) thatcontrols the chamber operation such that the processes are performed.

In some embodiments, the controller 495 has one or more configurationsto execute individual processes or sub-processes to perform the method.The controller 495 can be connected to and configured to operateintermediate components to perform the functions of the methods. Forexample, the controller 495 can be connected to and configured tocontrol one or more of gas valves, actuators, motors, slit valves,vacuum control or other components.

Additional embodiments of the disclosure are directed to methods ofcalibrating the top chamber 100 under vacuum according to one or moreembodiment of the disclosure is described. The method comprises thesteps of: aligning a top surface of one or more substrate supportsurfaces 231 located within a interior volume 109 with a chamber lid 300to establish a process gap, the one or more substrate support surfaces231 connected to a support post 190 that extends through an opening 120in the chamber floor 106 and an opening in a support plate 320 attachedto a bottom surface 118 of the chamber floor 106; and creating a vacuumenvironment within the interior volume 109 causing the chamber floor 106to deflect toward the interior volume 109 while maintaining the processgap. The process gap is between 1 mm and 2 mm.

Reference throughout this specification to “one embodiment,” “certainembodiments,” “one or more embodiments” or “an embodiment” means that aparticular feature, structure, material, or characteristic described inconnection with the embodiment is included in at least one embodiment ofthe disclosure. Thus, the appearances of the phrases such as “in one ormore embodiments,” “in certain embodiments,” “in one embodiment” or “inan embodiment” in various places throughout this specification are notnecessarily referring to the same embodiment of the disclosure.Furthermore, the particular features, structures, materials, orcharacteristics may be combined in any suitable manner in one or moreembodiments.

Although the disclosure herein has been described with reference toparticular embodiments, those skilled in the art will understand thatthe embodiments described are merely illustrative of the principles andapplications of the present disclosure. It will be apparent to thoseskilled in the art that various modifications and variations can be madeto the method and apparatus of the present disclosure without departingfrom the spirit and scope of the disclosure. Thus, the presentdisclosure can include modifications and variations that are within thescope of the appended claims and their equivalents.

What is claimed is:
 1. A cable management system comprising: an outertrough assembly comprising: an outer trough boundary having asemi-cylindrical shape with a central axis, an inner surface and anouter surface, and, an outer guide having a semi-cylindrical shape witha central axis, an inner surface and an outer surface, the central axisof the outer guide coaxial with the central axis of the outer troughboundary; and an inner trough assembly positioned within the outertrough assembly, the inner trough assembly comprising: a bottom platehaving a top surface and a bottom surface, a base having a top surfaceand bottom surface, the bottom surface of the base connected to the topsurface of the bottom plate, an semi-cylindrical inner guide connectedto the base, the semi-cylindrical inner guide having an inner surfaceand an outer surface, the semi-cylindrical inner guide having an axisnormal to the base, and a mounting bracket having a top portion and abottom portion connected to the base, an inner surface and an outersurface, the top portion having a connector plate and a shaft couplingconfigured to receive a hollow support shaft, wherein a channel isformed between the inner surface of the outer guide of the outer troughassembly and the inner surface of the outer surface of the mountingbracket.
 2. The cable management system of claim 1, further comprising astator bracket connected to the outer guide.
 3. The cable managementsystem of claim 2, wherein the stator bracket is connected to the outertrough boundary.
 4. The cable management system of claim 3, furthercomprising a stator positioned on the stator bracket, and a rotorpositioned around the stator and connected to the inner trough assembly,the rotor and stator configured to cooperatively interact to cause theinner trough assembly to rotate within the outer trough assembly.
 5. Thecable management system of claim 1, wherein the outer trough assemblyfurther comprises a semi-circular base plate connected to a bottom ofthe semi-cylindrical boundary.
 6. The cable management system of claim1, wherein the inner trough assembly further comprises a hard stopdisposed on an outer surface of the shaft coupling, the hard stopconfigured to limit rotation of the inner trough assembly relative tothe outer trough assembly.
 7. The cable management system of claim 1,further comprising a plurality of chain links configured to receive twoor more cables within.
 8. The cable management system of claim 7, theplurality of chain links further comprising a fixed end and a movingend, the fixed end connected to one or more of a power source, relay orcontroller, the moving end connected to the mounting bracket.
 9. Thecable management system of claim 8, wherein the channel is configured toguide the moving end of the plurality of chain links relative to theouter trough assembly.
 10. The cable management system of claim 7,wherein the plurality of chain links are made of plastic or a polymer.11. The cable management system of claim 7, wherein the plurality ofchain links is configured to account for the mechanical properties ofthe at least one cable.
 12. The cable management system of claim 7,wherein the plurality of chain links is configured to account for bendradius, strain relief and radius of curvature of the at least one cable.13. The cable management system of claim 7, wherein the two or morecables are arranged in a side-by-side vertical orientation in a firstrow.
 14. The cable management system of claim 7, wherein a second row oftwo or more cables are positioned adjacent to the first row of cables ina side-by-side horizontal orientation relative to the first row.
 15. Thecable management system of claim 1, further comprising a hollow shaftextending from the shaft coupling.
 16. The cable management system ofclaim 15 further comprising a rotary fluid union within the mountingbracket configured to deliver fluid to a plurality of fluid tubesextending through the cavity of the shaft.
 17. The cable managementsystem of claim 16, wherein the fluid union comprises a top portion anda bottom portion, the top portion comprising a bracket configured toconnect to the mounting bracket of the inner trough assembly.
 18. Thecable management system of claim 17, wherein the bracket is rotatablerelative to the bottom portion of the fluid union.
 19. A processingassembly comprising: a top chamber having a at least one substratesupport; a support shaft having a top end and a bottom end, the top endextending through the top chamber, the top end connected to thesubstrate support; a robot spindle assembly connected to the topchamber; a cable management system comprising: an outer trough assemblycomprising: an outer trough boundary having a semi-cylindrical shapewith a central axis, an inner surface and an outer surface, and, anouter guide having a semi-cylindrical shape with a central axis, aninner surface and an outer surface, the central axis of the outer guidecoaxial with the central axis of the outer trough boundary; and an innertrough assembly positioned within the outer trough assembly, the innertrough assembly comprising: a bottom plate having a top surface and abottom surface, a base having a top surface and bottom surface, thebottom surface of the base connected to the top surface of the bottomplate, an semi-cylindrical inner guide connected to the base, thesemi-cylindrical inner guide having an inner surface and an outersurface, the semi-cylindrical inner guide having an axis normal to thebase, and a mounting bracket having a top portion and a bottom portionconnected to the base, an inner surface and an outer surface, the topportion having a connector plate and a shaft coupling configured toreceive a hollow support shaft, a stator connected to a stator bracket,the stator bracket connected to the outer trough boundary of the anouter trough assembly; wherein a channel is formed between the innersurface of the outer guide of the outer trough assembly and the innersurface of the outer surface of the mounting bracket.
 20. A cablemanagement system comprising: an outer trough assembly comprising: anouter trough boundary having a semi-cylindrical shape with a centralaxis, an inner surface and an outer surface, and, an outer guide havinga semi-cylindrical shape with a central axis, an inner surface and anouter surface, the central axis of the outer guide coaxial with thecentral axis of the outer trough boundary; and an inner trough assemblypositioned within the outer trough assembly, the inner trough assemblycomprising: a bottom plate having a top surface and a bottom surface, abase having a top surface and bottom surface, the bottom surface of thebase connected to the top surface of the bottom plate, ansemi-cylindrical inner guide connected to the base, the semi-cylindricalinner guide having an inner surface and an outer surface, thesemi-cylindrical inner guide having an axis normal to the base, and amounting bracket having a top portion and a bottom portion connected tothe base, an inner surface and an outer surface, the top portion havinga connector plate and a shaft coupling configured to receive a hollowsupport shaft, a hollow shaft extending from the shaft coupling a statorbracket connected to the outer guide, the stator bracket connected tothe outer trough boundary; a stator positioned on the stator bracket,and a rotor positioned around the stator and connected to the innertrough assembly, the rotor and stator configured to cooperativelyinteract to cause the inner trough assembly to rotate within the outertrough assembly; a plurality of chain links configured to receive atleast one cable within; and, a rotary fluid union within the mountingbracket configured to deliver fluid to a plurality of fluid tubesextending through the cavity of the shaft wherein a channel is formedbetween the inner surface of the outer guide of the outer troughassembly and the inner surface of the outer surface of the mountingbracket; wherein the outer trough assembly further comprises asemi-circular base plate connected to a bottom of the semi-cylindricalboundary; wherein the inner trough assembly further comprises a hardstop disposed on an outer surface of the shaft coupling, the hard stopconfigured to limit rotation of the inner trough assembly relative tothe outer trough assembly.